Characterization of a-B5C:H prepared by PECVD of orthocarborane: Results of preliminary FTIR and nuclear reaction analysis studies

Journal of Non-Crystalline Solids

Volumn 354, Issue 19-25, 2008, Pages 2369-2371

  Schulz, Douglas L ^a,b   Lutfurakhmanov, Artur ^a,b   Mayo, Bret ^a   Sandstrom, Joseph ^a   Bunzow, David ^a   Qadri, Syed B ^c   Bao, Ruqiang ^d   Chrisey, Douglas B ^a,d   Caruso, A N ^e  

^a NORTH DAKOTA STATE UNIVERSITY   (United States)

^b North Dakota State University   (United States)

^c NAVAL RESEARCH LABORATORY   (United States)

^d RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^e UNIVERSITY OF MISSOURI KANSAS CITY   (United States)

Author keywords

Chemical vapor deposition; FTIR measurements

Indexed keywords

CONCENTRATION (PROCESS); FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN; MEASUREMENT THEORY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REACTION KINETICS;

FTIR MEASUREMENTS; ORTHOCARBORANE; PROPORTIONALITY CONSTANT;

AMORPHOUS SILICON;

EID: 42649107478     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2007.10.077     Document Type: Article

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