Nickel doping of boron carbide grown by plasma enhanced chemical vapor deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 4, 1996, Pages 2957-2960

  Hwang, Seong Don ^a  

^a UNIVERSITY OF NEBRASKA LINCOLN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001258373     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588942     Document Type: Article

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