Field-absorbed water induced electrochemical processes in organic thin film junctions

Journal of Physical Chemistry C

Volumn 114, Issue 37, 2010, Pages 15791-15796

  Knorr, Nikolaus ^a   Wirtz, René ^a   Rosselli, Silvia ^a   Nelles, Gabriele ^a  

^a Sony Deutschland GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORBED WATER; BOTTOM ELECTRODES; COPPER SULFIDES; COUNTER-CLOCKWISE; CRYSTAL FORMATION; CU ELECTRODE; CURRENT FLOWS; CURRENT HYSTERESIS; DRY CONDITION; ELECTROCHEMICAL PROCESS; ELECTROCHEMICAL REACTIONS; ELECTRODE REACTIONS; FILAMENT FORMATION; ION DRIFTS; METAL FILAMENTS; METAL JUNCTIONS; ON CURRENTS; ORGANIC DIODES; ORGANIC MATERIALS; ORGANIC THIN FILMS; ORGANIC THIN-FILM DEVICES; PIT CORROSION; POLY-3-HEXYLTHIOPHENE; RELATIVE HUMIDITIES; RESISTIVE SWITCHING; THRESHOLD FIELDS;

ATMOSPHERIC HUMIDITY; DECAY (ORGANIC); DISSOLUTION; ELECTRODES; FILAMENTS (LAMP); GOLD; HYSTERESIS; IONIZATION OF LIQUIDS; METAL RECOVERY; THIN FILM DEVICES; THIN FILMS; WATER ABSORPTION;

COPPER;

EID: 77956844748     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp103625w     Document Type: Article

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