Soft x-ray charging method for a silicon electret condenser microphone

Applied Physics Express

Volumn 3, Issue 9, 2010, Pages

  Hagiwara, Kei ^a   Goto, Masahide ^a   Iguchi, Yoshinori ^a   Yasuno, Yoshinobu ^b   Kodama, Hidekazu ^b   Kidokoro, Kenichi ^c   Tajima, Toshifumi ^a  

^a NHK SCIENCE AND TECHNICAL RESEARCH LABORATORIES   (Japan)

^b KOBAYASI INSTITUTE OF PHYSICAL RESEARCH   (Japan)

^c RION Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED ELECTRIC FIELD; CHARGING RATE; CONDENSER MICROPHONE; GAP DISTANCES; IRRADIATION TIME; RETENTION PROPERTIES; SOFT X-RAY;

DIELECTRIC FILMS; ELECTRETS; ELECTRIC FIELDS; IRRADIATION; POLYETHERIMIDES; SILICON COMPOUNDS; SILICON OXIDES; SUN; X RAY LITHOGRAPHY; X RAYS;

MICROPHONES;

EID: 77956773116     PISSN: 18820778     EISSN: 18820786     Source Type: Journal    
DOI: 10.1143/APEX.3.091502     Document Type: Article

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