Influence of oxygen partial pressure on the epitaxial MgFe 2O4 thin films deposited on SrTiO3 (100) substrate

Journal of Alloys and Compounds

Volumn 503, Issue 2, 2010, Pages 460-463

  Kim, Kyoung Sun ^a   Muralidharan, P ^a   Han, Seung Ho ^a   Kim, Jeong Seog ^b   Kim, Ho Gi ^a   Cheon, Chae Il ^b  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Hoseo University   (South Korea)

Author keywords

Epitaxy; Magnetic property; PLD; Pressure effect; SEM; Thin films; XRD

Indexed keywords

DEPOSITION; EPITAXIAL GROWTH; FILMS; MAGNETIC PROPERTIES; OXYGEN; PARTIAL PRESSURE; PRESSURE EFFECTS; PULSED LASER DEPOSITION; SATURATION MAGNETIZATION; SCANNING ELECTRON MICROSCOPY; STRONTIUM ALLOYS; STRONTIUM TITANATES; SUBSTRATES;

HIGH OXYGEN PARTIAL PRESSURE; INFLUENCE OF OXYGEN; MAGNETIC BEHAVIOR; OXYGEN PARTIAL PRESSURE; OXYGEN PRESSURE; PULSED-LASER DEPOSITION TECHNIQUE; STICKING COEFFICIENTS; TARGET MATERIALS;

THIN FILMS;

EID: 77956666504     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2010.05.033     Document Type: Article

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