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Applied Physics A: Materials Science and Processing

Volumn 75, Issue 5, 2002, Pages 551-554

Influence of inert gas pressure on deposition rate during pulsed laser deposition

(2) Scharf, T a Krebs, H U a

a UNIVERSITY OF GÖTTINGEN (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

INTERFACES (MATERIALS); KINETIC ENERGY; NICKEL ALLOYS; PARTICLES (PARTICULATE MATTER); PRESSURE EFFECTS; PULSED LASER DEPOSITION; SCATTERING; SILVER; SPUTTERING; STOICHIOMETRY; VACUUM APPLICATIONS;

DEPOSITION RATE; INERT GAS PRESSURE; METALLIC ALLOY FILMS; PARTICLE ENERGY; PLASMA PLUME; RESPUTTERING;

INERT GASES;

EID: 0036835772 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s00339-002-1442-4 Document Type: Article

Times cited : (70)

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