Optimization of ion energy spread in inductively coupled plasma source designed for focused ion beam applications

Vacuum

Volumn 85, Issue 2, 2010, Pages 344-348

  Nabhiraj, P Y ^a   Menon, Ranjini ^a   Mohan Rao, G ^b   Mohan, S ^b   Bhandari, R K ^a  

^a VARIABLE ENERGY CYCLOTRON CENTRE   (India)

^b INDIAN INSTITUTE OF SCIENCE   (India)

Author keywords

Faraday shield; Inductively coupled plasma; Ion energy spread; Retarding field energy analyzer

Indexed keywords

CAPACITIVE COUPLINGS; DOUBLE PEAK; FARADAY SHIELDS; INDUCTIVELY-COUPLED; ION ENERGY DISTRIBUTIONS; ION ENERGY SPREAD; ION-BEAM APPLICATIONS; LOW ENERGIES; PLASMA CHAMBERS; POWER COUPLING; RETARDING FIELD ENERGY ANALYZERS; RF POWER; SINGLE PEAK; SOURCE PARAMETERS;

ELECTRIC POWER DISTRIBUTION; ELECTROMAGNETIC INDUCTION; FOCUSED ION BEAMS; HIGH ENERGY PHYSICS; INDUCTIVELY COUPLED PLASMA; ION SOURCES; OPTIMIZATION; PLASMA SOURCES;

IONS;

EID: 77956620077     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2010.07.008     Document Type: Article

References (12)

1. Ka-Ngo Leung Plasma sources for electrons and ion beams J Vac Sci Technol B 17 1999 2776 2778
2. Huashun Zhang Ion sources 1999 Science Press Beijing
3. Y. Lee, R.A. Gough, W.B. Kunkel, K.N. Leung, L.T. Perkins, and D.S. Pickard Development of ion sources for ion projection lithography J Vac Sci Technol B 14 1996 3947 3950
4. M.A. Lieberman, and A.J. Lichtenberg Principles of plasma discharges and materials processing 1994 John Wiley and Sons New York
5. I.H. Hutchinson Principles of plasma diagnostics 2nd ed. 2002 Cambridge University Press Cambridge
6. Christian Bohm, and Jerome Perrin Retarding field analyser for measurements of ion energy distributions and secondary electron emission coefficients in low pressure radio frequency discharges Rev Sci Instrum 64 1993 31 44
7. C.L. Enloe High-resolution retarding potential analyzer Rev Sci Instrum 65 1994 507 508
8. K.U. Riemann The Bohm criterion and sheath formation J Phys D 24 1991 493 518
9. U. Kortshagen, and M. Zethoff Ion energy distribution function in a planar inductively coupled RF discharges Plasma Sources Sci Technol 4 1995 541 550
10. Rainer Hippler, Jana Kredl, and vasile Varolomei Ion energy distribution of an inductively coupled radiofrequency discharge in argon and oxygen Vacuum 83 2009 732 737
11. C. Charles Plasma for spacecraft propulsion J Phys D Appl Phys 42 2009 163001
12. J. Reece Roth. Industrial plasma engineering vol. 2: Applications to non-thermal plasma processing. Bristol, 2001.