Development of ion sources for ion projection lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 3947-3950

  Lee, Y ^a,b   Gough, R A ^a   Kunkel, W B ^a   Leung, K N ^a   Perkins, L T ^a,b   Pickard, D S ^a   Sun, L ^a   Vujic, J ^a,b   Williams, M D ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b Etcheverry Hall MCI 730   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTENNAS; CATHODES; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC DISCHARGES; HELIUM; ION BEAMS; ION SOURCES; IONIZATION; IONS; MAGNETIC FIELDS; MAGNETIC FILTERS; PLASMAS;

ENERGY SPREAD; FILAMENT DISCHARGE; ION PROJECTION LITHOGRAPHY; MULTICUSP SOURCE CHAMBERS; PLASMA DISCHARGE;

ION BEAM LITHOGRAPHY;

EID: 0030286107     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588701     Document Type: Article

References (4)

1. W. Finkelstein and A. Mondelli, Semicond. Int. 6, 107 (1995) .
2. C. F. Chan and K-N. Leung, Particle Accelerators 43, 145 (1994) .
3. Y. Lee, L. T. Perkins, R. A. Gough, M. Hoffmann, W. B. Kunkel, K. N. Leung, M. Sarstedt, J. Vujic, M. Weber, and M. D. Williams, Nucl. Instrum. Methods (to be published).
4. L. T. Perkins, W. B. Kunkel, Y. Lee, K. N. Leung, D. S. Pickard, and M. D. Williams (to be published).