SCOPUS 정보 검색 플랫폼

Vacuum

Volumn 85, Issue 2, 2010, Pages 297-301

Microstructure and electrical properties of ultrathin gold films prepared by DC sputtering

(3) Sun, Zhaoqi a Lü, Jianguo a,b Song, Xueping a

a ANHUI UNIVERSITY (China)

b HEFEI NORMAL UNIVERSITY (China)

Author keywords

Atomic force microscopy; Temperature coefficient of resistance; Transmission electron microscope; Ultrathin Au films

Indexed keywords

AVERAGE PARTICLE SIZE; DC SPUTTERING; DIRECT CURRENT MAGNETRON SPUTTERING; ELECTRICAL PROPERTY; FOUR-WIRE; GOLD FILM; RMS ROUGHNESS; SURFACE MORPHOLOGY ANALYSIS; TEMPERATURE COEFFICIENT OF RESISTANCE; TRANSMISSION ELECTRON MICROSCOPE; ULTRA-THIN;

ATOMIC FORCE MICROSCOPY; ATOMS; DC POWER TRANSMISSION; ELECTRIC PROPERTIES; ELECTRON MICROSCOPES; GOLD; METALLIC FILMS; PARTICLE SIZE ANALYSIS; TRANSMISSION ELECTRON MICROSCOPY; ULTRATHIN FILMS; X RAY DIFFRACTION;

FILM PREPARATION;

EID: 77956619563 PISSN: 0042207X EISSN: None Source Type: Journal
DOI: 10.1016/j.vacuum.2010.06.010 Document Type: Article

Times cited : (8)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.