Characterization of nickel silicides using EELS-based methods

Journal of Microscopy

Volumn 240, Issue 1, 2010, Pages 75-82

  Verleysen, E ^a,b   Bender, H ^a   Richard, O ^a   Schryvers, D ^c   Vandervorst, W ^a,b  

^a IMEC   (Belgium)

^b KU LEUVEN   (Belgium)

^c UNIVERSITY OF ANTWERP   (Belgium)

Author keywords

EELS; ELNES; low loss EELS; nickel silicides

Indexed keywords

ELECTRON SCATTERING; ENERGY DISSIPATION; NICKEL; NICKEL COMPOUNDS; PLASMONS; SILICIDES;

ELECTRON ENERGY-LOSS SPECTROSCOPIES; ENERGY LOSS NEAR EDGE STRUCTURE; LINE INTENSITIES; LOSS ELECTRONS; LOW LOSS ELECTRON ENERGY LOSS SPECTROSCOPY; LOW-LOSS; NI-SILICIDE; NICKEL SILICIDE; WHITE LINES;

ELECTRON ENERGY LOSS SPECTROSCOPY;

NICKEL COMPLEX; SILICON DERIVATIVE;

ANALYTIC METHOD; ARTICLE; ELECTRON; ELECTRON ENERGY LOSS SPECTROSCOPY; ENERGY; NONHUMAN; PRIORITY JOURNAL; QUANTITATIVE ANALYSIS;

EID: 77956506287     PISSN: 00222720     EISSN: 13652818     Source Type: Journal    
DOI: 10.1111/j.1365-2818.2010.03391.x     Document Type: Article

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