Inhibition of copper corrosion by self-assembled monolayers of triazole derivative in chloride-containing solution

Journal of Solid State Electrochemistry

Volumn 14, Issue 8, 2010, Pages 1391-1399

  Liang, Chenghao ^a,b   Wang, Peng ^b   Wu, Bo ^b   Huang, Naibao ^a  

^a DALIAN MARITIME UNIVERSITY   (China)

^b DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Inhibition; Metals and alloys; SAMs; Triazole derivative

Indexed keywords

ANTI-CORROSION PROPERTY; COPPER SURFACE; ELECTROCHEMICAL MEASUREMENTS; ELECTROCHEMICAL TECHNIQUES; IMMERSION TIME; INHIBITION; INITIAL ADSORPTION; LANGMUIR MODELS; METALS AND ALLOYS; SAMS; TRIAZOLE DERIVATIVES; ULTRASONIC IRRADIATION;

ADSORPTION; CHLORINE COMPOUNDS; CONTACT ANGLE; COPPER; COPPER CORROSION; METALLURGY; NITROGEN COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

SELF ASSEMBLED MONOLAYERS;

EID: 77956477067     PISSN: 14328488     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10008-009-0956-5     Document Type: Article

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