Physical properties characterization of WO3 films grown by hot-filament metal oxide deposition

Materials Science and Engineering: B

Volumn 174, Issue 1-3, 2010, Pages 182-186

  Diaz Reyes J ^a   Delgado Macuil, R J ^a   Dorantes Garcia V ^b   Perez Benitez A ^b   Balderas Lopez J A ^a   Ariza Ortega, J A ^a  

^a INSTITUTO POLITÉCNICO NACIONAL   (Mexico)

^b BENEMÉRITA UNIVERSIDAD AUTÓNOMA DE PUEBLA   (Mexico)

Author keywords

Advances for electrochromics; Compound semiconductors; Hot Filament Metal Oxide Deposition; Novel Materials and Technological; Semiconductors growth

Indexed keywords

ATMOSPHERIC PRESSURE; CRYSTALLINE MATERIALS; DEPOSITION; ENERGY GAP; FILM GROWTH; METALS; OXIDE FILMS; OXYGEN; STRETCHING; TUNGSTEN COMPOUNDS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ADVANCE FOR ELECTROCHROMIC; COMPOUND SEMICONDUCTORS; DEPOSITION TECHNIQUE; ELECTROCHROMICS; HOT FILAMENT METAL OXIDE DEPOSITION; HOT-FILAMENT; METAL OXIDE DEPOSITION; NOVEL MATERIAL AND TECHNOLOGICAL; NOVEL MATERIALS; PHYSICAL PROPERTIES CHARACTERIZATION;

SEMICONDUCTOR GROWTH;

EID: 77956468891     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2010.03.061     Document Type: Conference Paper

References (28)

1. C.G. Granqvist P.J. Gellings, H.J.M. Bouwmesster, The CRC Handbook of Solid State Electrochemistry 1997 CRC Press, Inc. Cleveland, Ohio
2. S.H. Lee, H.M. Cheong, P. Liu, D. Smith, C.E. Tracy, A. Mascarenhas, J.R. Pitts, and S.K. Deb J. Appl. Phys. 88 2000 3076 3078
3. J.F. Roland, and F.C. Anson J. Electroanal. Chem. 336 1992 245 261
4. A. Monteiro, M.F. Costa, B. Almeida, V. Teixeira, J. Gago, and E. Roman Vacuum 64 2002 287 291
5. W. Demiryont SPIE 323 1990 171 187
6. N. Sbar, M. Badding, R. Budziak, K. Cortez, L. Laby, L. Michalski, T. Ngo, S. Chulz, and K. Urbanik Sol. Energy Mater. Sol. Cells 56 1999 321 341
7. Y. Li, Y. Aikawa, A. Kishimoto, and T. Kudo Electrochim. Acta 39 1994 807 812
8. C.G. Granqvist Sol. Energy Mater. Sol. Cells 60 2000 201 262
9. B.V. Kolesov, T.V. Basova, and I.K. Igumenov Thin Solid Films 304 1997 166 169
10. B. Zhao, X. Xu, J. Gao, Q. Fu, and Y. Tang J. Raman Spectrosc. 27 1998 549 554
11. J. Martínez-Juárez, and J. Díaz-Reyes Proc. SPIE 7142 2008 71420Q1-71420Q6
12. P.R. Bueno, F.M. Pontes, E.R. Leite, L.O.S. Bulhões, P.S. Pizani, P.N. Lisboa-Filho, and W.H. Schreiner J. Appl. Phys. 96 2004 2102 2109
13. A. Rougier, F. Portemer, A. Quédé, and M. El Marssi Appl. Surf. Sci. 153 1999 1 9
14. G. Atanassov, R. Thielsch, and D. Popov Thin Solid Films 223 1993 288 292
15. C.J. Wright J. Solid State Chem. 20 1977 89 92
16. M.F. Daniel, B. Desbat, J.C. Lassegues, B. Gerand, and M. Figlarz J. Solid State Chem. 67 1987 235 247
17. J. Pfeifer, Cao Guifang, P.T. Tekula-Buxbaum, B.A. Kiss, M. Farkas-Jahnke, and K. Vadasdi J. Solid State Chem. 119 1995 90 97
18. M.F. Daniel, B. Desbat, J.C. Lassegues, and R. Garie J. Solid State Chem. 73 1988 127 139
19. L. Dixit, S.K. Kapoor, I.D. Singh, and P.L. Gupta Indian J. Phys. B 51 1977 116 121
20. P. Tägtström, and U. Jansson Thin Solid Films 352 1999 107 113
21. G.A. de Wijs, and R.A. de Groot Electrochim. Acta 46 2001 1989 1993
22. E. Salje Acta Crystallogr. A 31 1975 360 363
23. M. Regragui, M. Addou, A. Outzourhit, J.C. Bernéde, Elb. El Idrissi, E. Benseddik, and A. Kachouane Thin Solid Films 358 2000 40 45
24. D. Gazzoli, M. Valigi, R. Dragone, A. Marucci, and G. Mattei J. Phys. Chem. B 101 1997 11129 11135
25. P.C. Liao, C.S. Chen, W.S. Ho, Y.S. Huang, and K.K. Tiong Thin Solid Films 301 1997 7 11
26. A. Portinha, V. Teixeira, J. Carneiro, M.F. Costa, N.P. Barradas, and A.D. Sequeira Surf. Coat. Technol. 188-189 2004 107 115
27. A.B.M. Harun-ur-Rashid, M. Kishi, and T. Katoda J. Appl. Phys. 80 1996 3540 3545
28. B. Yang, Y. Zhang, E. Drabarek, P.R.F. Barnes, and V. Luca Chem. Mater. 19 2007 5664 5672