Electrochemically assisted deposition as a new route to transparent conductive indium tin oxide films

Chemistry of Materials

Volumn 22, Issue 17, 2010, Pages 4939-4949

  Kovtyukhova, Nina I ^a   Mallouk, Thomas E ^a  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASSISTED DEPOSITION; ATOMIC ENVIRONMENT; ATOMIC RATIO; CATHODIC DEPOSITION; CHARACTERIZATION METHODS; CUBIC CRYSTAL STRUCTURES; ELECTRICAL MEASUREMENT; ELECTRONIC CONDUCTIVITY; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; INDIUM TIN OXIDE FILMS; ITO FILMS; ORDERS OF MAGNITUDE; SUBMICROMETERS; THERMAL CONVERSION; TIN DOPED INDIUM OXIDE; TRANSPARENT CONDUCTIVE; UV VISIBLE SPECTROSCOPY;

ATOMS; CHEMICAL VAPOR DEPOSITION; CONDUCTIVE FILMS; CRYSTAL ATOMIC STRUCTURE; FIELD EMISSION; FIELD EMISSION MICROSCOPES; INDIUM; INDIUM COMPOUNDS; ITO GLASS; MORPHOLOGY; NANORODS; SCANNING ELECTRON MICROSCOPY; TIN; TIN OXIDES; TITANIUM COMPOUNDS; ULTRAVIOLET SPECTROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

OXIDE FILMS;

EID: 77956408094     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm101576r     Document Type: Article

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