Beat the diffraction limit in 3D direct laser writing in photosensitive glass

Optics Express

Volumn 17, Issue 12, 2009, Pages 10304-10318

  Bellec, Matthieu ^a   Royon, Arnaud ^a,b   Bousquet, Bruno ^a   Bourhis, Kevin ^a   Treguer, Mona ^a   Cardinal, Thierry ^a   Richardson, Martin ^b   Canioni, Lionel ^a  

^a UNIVERSITÉ DE BORDEAUX   (France)

^b UNIVERSITY OF CENTRAL FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION; INJECTION MOLDING; NANOSTRUCTURES; PHOTONIC DEVICES;

ARBITRARY PATTERNS; DIRECT LASER WRITING; LASER DIRECT STRUCTURING; OPTICAL DIFFRACTIONS; PHOTONIC APPLICATION; SUBWAVELENGTH NANOSTRUCTURES; THREEDIMENSIONAL (3-D); TRANSPARENT MATERIAL;

PHOTOSENSITIVE GLASS;

GLASS;

ARTICLE; CHEMISTRY; COMPUTER AIDED DESIGN; EQUIPMENT; EQUIPMENT DESIGN; INSTRUMENTATION; LASER; METHODOLOGY; RADIATION EXPOSURE; REFRACTOMETRY; REPRODUCIBILITY; SENSITIVITY AND SPECIFICITY;

COMPUTER-AIDED DESIGN; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; GLASS; LASERS; REFRACTOMETRY; REPRODUCIBILITY OF RESULTS; SENSITIVITY AND SPECIFICITY;

EID: 66849119076     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.17.010304     Document Type: Article

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