Design analysis of doped-silicon surface plasmon resonance immunosensors in mid-infrared range

Optics Express

Volumn 18, Issue 18, 2010, Pages 19396-19406

  DiPippo, William ^a   Lee, Bong Jae ^b   Park, Keunhan ^a  

^a University of Rhode Island   (United States)

^b PA 15260   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DESIGN; ELECTROMAGNETIC FIELDS; FINITE ELEMENT METHOD; GOLD COATINGS; IMMUNOSENSORS; INFRARED DEVICES; PLASMONS; SENSORS;

ANALYTES; BATCH PROTOCOLS; BIOSENSING; DESIGN ANALYSIS; DESIGN FEASIBILITY; DETECTION SENSITIVITY; ELECTROMAGNETIC FIELD DISTRIBUTION; FINITE ELEMENT ANALYSIS; FLAT GRATINGS; FTIR; GEOMETRIC PARAMETER; GOLD LAYER; HEAVILY DOPED; LAYER THICKNESS; LIMIT OF DETECTION; MANUFACTURING COST; METALLIC GRATINGS; MICROFABRICATED; MID-INFRARED RANGE; MIDINFRARED; NORMAL INCIDENCE; PLASMON RESONANCES; RIGOROUS COUPLED WAVE ANALYSIS; SILICON SURFACES; SPR EXCITATION; SPR SENSORS; SURFACE PLASMON RESONANCE SENSOR; TUNABILITIES;

SURFACE PLASMON RESONANCE;

GOLD; ION; SILICON;

ALGORITHM; ARTICLE; CHEMISTRY; EQUIPMENT DESIGN; FINITE ELEMENT ANALYSIS; FOURIER ANALYSIS; GENETIC PROCEDURES; INFRARED SPECTROPHOTOMETRY; INFRARED SPECTROSCOPY; INSTRUMENTATION; METHODOLOGY; OPTICS; REFRACTOMETRY; REPRODUCIBILITY; SURFACE PLASMON RESONANCE;

ALGORITHMS; BIOSENSING TECHNIQUES; EQUIPMENT DESIGN; FINITE ELEMENT ANALYSIS; FOURIER ANALYSIS; GOLD; IONS; OPTICS AND PHOTONICS; REFRACTOMETRY; REPRODUCIBILITY OF RESULTS; SILICON; SPECTROPHOTOMETRY, INFRARED; SPECTROSCOPY, FOURIER TRANSFORM INFRARED; SURFACE PLASMON RESONANCE;

EID: 77956353997     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.019396     Document Type: Article

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