Electron irradiation effects on electrical and optical properties of sol-gel prepared ZnO films

Journal of Applied Physics

Volumn 108, Issue 4, 2010, Pages

  Bhat, J S ^a   Patil, A S ^a   Swami, N ^a   Mulimani, B G ^a   Gayathri, B R ^a,b   Deshpande, N G ^c   Kim, G H ^c   Seo, M S ^c   Lee, Y P ^c  

^a KARNATAK UNIVERSITY   (India)

^b JSS College   (India)

^c Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION EDGES; ALUMINUM-DOPED ZINC OXIDE; BEFORE AND AFTER; BLUE SHIFT; CRYSTALLINITIES; ELECTRICAL AND OPTICAL PROPERTIES; ELECTRON BEAM IRRADIATION; GRAIN SIZE; SOL-GEL TECHNIQUE; STRUCTURAL HOMOGENEITY; ZNO; ZNO FILMS; ZNO:AL FILMS;

ABSORPTION; CARRIER CONCENTRATION; DOPING (ADDITIVES); ELECTRIC PROPERTIES; ELECTRIC RESISTANCE; ELECTRON BEAMS; ELECTRON IRRADIATION; ELECTRON OPTICS; ELECTRONS; FILM PREPARATION; GELS; METALLIC FILMS; OPTICAL CONSTANTS; OXIDE FILMS; SHEET RESISTANCE; SOL-GEL PROCESS; SOL-GELS; SOLS; ZINC; ZINC OXIDE;

OPTICAL PROPERTIES;

EID: 77956335648     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3452333     Document Type: Conference Paper

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