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Volumn 108, Issue 4, 2010, Pages

Nanocrystals formation and intense green emission in thermally annealed AlN:Ho films for microlaser cavities and photonic applications

(6) Maqbool, Muhammad a Ali, Ghafar b Cho, Sung Oh b Ahmad, Iftikhar c Mehmood, Mazhar d Kordesch, Martin E e

a BALL STATE UNIVERSITY (United States)

b Korea Advanced Institute of Science and Technology (KAIST) (South Korea)

c HAZARA UNIVERSITY (Pakistan)

d PAKISTAN INSTITUTE OF ENGINEERING AND APPLIED SCIENCES (Pakistan)

e OHIO UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; ALN; ANNEALED FILMS; CRYSTALLINE STRUCTURE; DIRECT OBSERVATION; GREEN EMISSIONS; LIQUID NITROGEN TEMPERATURE; MICROLASER; NAKED-EYE; NITROGEN ATMOSPHERES; PHOTONIC APPLICATION; SILICON SUBSTRATES; SPUTTERED THIN FILMS; STRUCTURAL CHANGE; SUBSTRATE SIZES; THERMAL ACTIVATION; THERMAL-ANNEALING;

AMORPHOUS FILMS; AMORPHOUS SILICON; ANNEALING; ATOMIC FORCE MICROSCOPY; CRYSTAL ATOMIC STRUCTURE; CRYSTALLINE MATERIALS; FIBER OPTICS; HOLMIUM; LIQUID NITROGEN; LIQUIDS; MAGNETRONS; OPTICAL FIBERS; OPTICAL INSTRUMENTS; PHOTONIC DEVICES; SUBSTRATES; SUPERCONDUCTING MATERIALS; X RAY DIFFRACTION;

OPTICAL FILMS;

EID: 77956301674 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3478770 Document Type: Conference Paper

Times cited : (11)

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