In-situ deposition of alkali and alkaline earth hydride thin films to investigate the formation of reactive hydride composites

Journal of Physical Chemistry C

Volumn 114, Issue 32, 2010, Pages 13895-13901

  Gonzalez Silveira, M ^a,b   Gremaud, R ^c   Schreuders, H ^d   Van Setten, M J ^e   Batyrev, E ^a   Rougier, A ^f   Dupont, L ^f   Bardaji E G ^e   Lohstroh, W ^e   Dam, B ^d  

^a VU UNIVERSITY AMSTERDAM   (Netherlands)

^b UNIVERSITAT AUTÒNOMA DE BARCELONA   (Spain)

^c SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^d DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^e KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^f UNIVERSITÉ DE PICARDIE JULES VERNE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ALKALINE EARTH; ATOMIC MIXING; BETHE-SALPETER EQUATION; BOROHYDRIDES; CRITICAL STEPS; DIELECTRIC FUNCTIONS; DIFFUSION PROCESS; ELECTRON HOLE PAIRS; EQUATION OF MOTION; HIGH TEMPERATURE AND PRESSURE; IN-SITU DEPOSITION; MULTI-LAYERED; OPTICAL GAP; OPTICAL MEASUREMENT; OPTICAL SPECTROPHOTOMETRY; PRESSURE DIFFERENTIAL SCANNING CALORIMETRY; QUASI PARTICLES; REACTIVE SYNTHESIS; ROOM TEMPERATURE; STRUCTURAL CHARACTERIZATION; TEM; THEORETICAL CALCULATIONS;

BORON; BORON COMPOUNDS; CALCIUM; DIFFERENTIAL SCANNING CALORIMETRY; EQUATIONS OF MOTION; HYDRIDES; MAGNESIUM; OPTICAL DATA PROCESSING; STRUCTURAL OPTIMIZATION; SYNTHESIS (CHEMICAL); THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

DEPOSITION;

EID: 77956167613     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp101704m     Document Type: Article

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