Optical, structural, and electrical properties of Mg2NiH 4 thin films in situ grown by activated reactive evaporation

Journal of Applied Physics

Volumn 100, Issue 6, 2006, Pages

  Westerwaal, R J ^a   Slaman, M ^a   Broedersz, C P ^a   Borsa, D M ^a   Dam, B ^a   Griessen, R ^a   Borgschulte, A ^b   Lohstroh, W ^c   Kooi, B ^d   Ten Brink, G ^d   Tschersich, K G ^e   Fleischhauer, H P ^e  

^a VU UNIVERSITY AMSTERDAM   (Netherlands)

^b INSTITUTE OF MATERIALS RESEARCH   (Germany)

^c KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^d UNIVERSITY OF GRONINGEN   (Netherlands)

^e FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DESORPTION; ELECTRIC RESISTANCE; ELECTRONIC PROPERTIES; EVAPORATION; HYDROGEN; MAGNESIUM COMPOUNDS; OPTICAL PROPERTIES; THIN FILMS;

ACTIVATED REACTIVE EVAPORATION; ATOMIC HYDROGEN; HYDROGEN DESORPTION; OPTICAL BAND GAPS;

METALLIC FILMS;

EID: 33749389547     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2349473     Document Type: Article

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