Hydrogenated amorphous/nanocrystalline silicon thin films on porous anodic alumina substrate

Surface Review and Letters

Volumn 17, Issue 3, 2010, Pages 283-288

  Kim, Sang Ok ^a   Khodin, Aliaksandr ^a   Lee, Joong Kee ^a  

^a Korea Institute of Science and Technology   (South Korea)

Author keywords

chemical vapor deposition; Hydrogenated amorphous silicon; porous anodic alumina; Raman spectra; textured surfaces; X ray diffraction

Indexed keywords

AMORPHOUS AND NANOCRYSTALLINE SILICON; CRYSTALLINITIES; ELECTRON CYCLOTRON RESONANCE-CHEMICAL VAPOR DEPOSITIONS; GAS COMPOSITIONS; GROWTH PROCESS; HYDROGENATED AMORPHOUS SILICON; HYDROGENATED SILICON; NANOCRYSTALLINE PHASIS; POROUS ANODIC ALUMINA; RAMAN SPECTRA; SILICON PHASIS; SILICON THIN FILM; STRUCTURAL CHARACTERIZATION; TEXTURED SUBSTRATES; TEXTURED SURFACE; X-RAY DIFFRACTION STUDIES;

ALUMINUM SHEET; AMORPHOUS FILMS; ARGON; CHEMICAL VAPOR DEPOSITION; CYCLOTRONS; DEPOSITION; DIFFRACTION; HYDROGENATION; NANOCRYSTALLINE SILICON; POROUS SILICON; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SUBSTRATES; SURFACE STRUCTURE; THIN FILMS; X RAY DIFFRACTION; X RAYS;

AMORPHOUS SILICON;

EID: 77956077366     PISSN: 0218625X     EISSN: None     Source Type: Journal    
DOI: 10.1142/S0218625X10013679     Document Type: Article

References (19)

1. R. A. Street (ed.), Technology and Application of Amorphous Silicon (Springer, Berlin, 1999).
2. D. L. Staebler and C. R. Wronski, Appl. Phys. Lett. 31 (1977) 292.
3. Y. Hamakawa, J. Non-Cryst. Solids 352 (2006) 863.
4. M. A. Green, Third Generation Photovoltaics: Ultra-High Efficiency at Low Cost (Springer-Verlag, Berlin, Germany, 2003).
5. S. Mukhopadhyay, R. Goswami and S. Ray, Solar Energy Mater. Solar Cells 93 (2009) 674.
6. N. Arpatzanis, A. T. Hatzopoulos, D. H. Tassis, C. A. Dimitriadis, F. Templier, M. Oudwan and G. Kamarinos, Microelectron. Reliab. 48 (2008) 531.
7. T. Shimizu, T. Xie, J. Nishikawa, S. Shingubara, S. Senz and U. Gösele, Adv. Mater. 19 (2007) 917.
8. H. J. Fan, P. Werner and M. Zacharias, Small 2 (2006) 700.
9. R. E. I. Schropp, J. K. Rath and H. Li, J. Cryst. Growth 311 (2009) 760.
10. Y. He, C. Yin, G. Cheng, L. Wang and X. Liu, J. Appl. Phys. 75 (1994) 797.
11. T. Kaneko, M. Wakagi, K. Onisawa and T. Minemura, Appl. Phys. Lett. 64 (1994) 1865.
12. D. Beeman, R. Tsu and M. F. Tporpe, Phys. Rev. B 32 (1985) 874.
13. A. Fritzsche, M. Tanielian, C. C. Tsai and P. J. Gaczi, J. Appl. Phys. 50 (1979) 3366.
14. K. Nielsch, J. Choi, K. Schwirn, R. B. Wehrspohn and U. Gösele, Nano Lett. 2 (2002) 677.
15. G. E. Thompson and G. C. Wood, Nature (London) 290 (1981) 230.
16. G. Yue, J. D. Lorentzen, J. Lin, Q. Wang and D. Han, Appl. Phys. Lett. 75 (1999) 492.
17. D. V. Tsu, B. S. Chao, S. R. Ovshinsky, S. J. Jones, J. Yang and S. Guha, Phys. Rev. B 63 (2001) 125338.
18. C. Droz, E. Vallat-Sauvain, J. Bailat, L. Feitknecht, J. Meier and A. Shah, Solar Energy Mater. Solar Cells 81 (2004) 61.
19. A. M. Funde, N. A. Bakr, D. K. Kamble, R. R. Hawaldar, D. P. Amalnerkar and S. R. Jadkar, Solar Energy Mater. Solar Cells 92 (2008) 1217.