Characterization of alkanethiol self-assembled monolayers on gold by thermal desorption spectroscopy

Langmuir

Volumn 26, Issue 12, 2010, Pages 9659-9665

  Stettner, Johanna ^a   Winkler, Adolf ^a  

^a GRAZ UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

ALKANETHIOLS; AU(1 1 1 ); FILM FORMATIONS; FUNCTIONAL END GROUPS; GOLD FOILS; MERCAPTOUNDECANOIC ACID; ORGANIC LAYERS; SAM FORMATION; SAMS; SPECIFIC INFORMATION; SUBSTRATE PRETREATMENT; TEMPERATURE REGIMES; THERMAL STABILITY; WET CHEMICAL PREPARATION;

GOLD; GOLD COATINGS; GOLD DEPOSITS; LOW ENERGY ELECTRON DIFFRACTION; MOLECULES; PHYSICAL VAPOR DEPOSITION; SELF ASSEMBLED MONOLAYERS; SULFUR; SURFACE CHEMISTRY; THERMAL DESORPTION; THERMAL DESORPTION SPECTROSCOPY;

AUGER ELECTRON SPECTROSCOPY;

GOLD; THIOL DERIVATIVE;

ARTICLE; ARTIFICIAL MEMBRANE; CHEMISTRY; HEAT; SPECTROSCOPY;

GOLD; HOT TEMPERATURE; MEMBRANES, ARTIFICIAL; SPECTRUM ANALYSIS; SULFHYDRYL COMPOUNDS;

EID: 77956065012     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la100245a     Document Type: Article

References (50)

1. Li, X. M.; Huskens, J.; Reinhoudt, D. N. J. Mater. Chem. 2004, 14, 2954.
2. Love, J. C.; Estroff., L. A.; Kriebel, J. K.; Nuzzo, R. G.; Whitesides, G. M. Chem. Rev. 2005, 105, 1103.
3. Schreiber, F. Prog. Surf. Sci. 2000, 65, 151.
4. Schreiber, F. J. Phys. (Paris) 2004, 16, 881.
5. Evans, S. D.; Williams, L. M. Funct. Org. Polym. Mater. 2000, 149.
6. Ulman, A. Chem. Rev. 1996, 96, 1533.
7. Ahn, H.; Cuong, P. D.; Park, S.; Kim, Y.; Lim, J. Sci. Direct 2003, 255, 819.
8. Cavalleri, O.; Natale, C.; Stroppolo, M. E.; Relini, A.; Cosulich, E.; Thea, S.; Novi, M.; Gliozzi, A. Phys. Chem. Chem. Phys. 2000, 2, 4630.
9. Cechet, F.; Marcaccio, M.; Margotti, M.; Paolucci, F.; Rapino, S.; Rudolf, P. J. Phys. Chem. B 2006, 110, 2241.
10. Leopold, M. C.; Bowden, E. F. Langmuir 2002, 18, 2239.
11. Nakano, K.; Yoshitake, T.; Yamashita, Y.; Bowden, E. F. Langmuir. 2007, 23, 6270.
12. Nuzzo, R. G.; Dubois, L. H.; Allara, D. L. J. Am. Chem. Soc. 1990, 112, 558.
13. Porter, M. D.; Bright, T. B.; Allara, D. L.; Chidsey, C. E. J. Am. Chem. Soc. 1987, 109, 3559.
14. Czanderna, A. W.; King, D.; Spaulding, D. J. Vac. Sci. Technol., A 1991, 5, 2607.
15. Duevel, R. V.; Corn, R. M. Anal. Chem. 1992, 64, 337.
16. Frey, B. L.; Corn, R. M. Anal. Chem. 1996, 68, 3187.
17. Arnold, R.; Azzam, W.; Terford, A.; Wöll, Ch. Langmuir 2002, 18, 3980.
18. Mendoza, S. M.; Arfaoui, I.; Zanarini, S.; Paolucci, F.; Rudolf, P. Langmuir 2007, 23, 582.
19. Wang, H.; Chen, S.; Li, L.; Jiang, S. Langmuir 2004, 7, 2633.
20. Creager, S. E.; Steiger, C. M. Langmuir 1995, 11, 1853.
21. Käfer, D.; Witte, G.; Cyganik, P.; Terfort, A.; Wöll, Ch. J. Am. Chem. Soc. 2006, 128, 1723.
22. Kondoh, H.; Kodama, C.; Sumida, H.; Nozoye, H. J. Chem. Phys. 1999, 3, 1175.
23. Schreiber, F.; Eberhardt, A.; Leung, T. Y.; Schwartz, P.; Wetterer, S. M.; Lavrich, D. J.; Berman, L.; Fenter, P.; Eisenberger, P.; Scoles, G. Phys. Rev. B 1998, 19, 12476.
24. Balzer, F.; Gerlach, R.; Polanski, G.; Rubahn, H.-G. Chem. Phys. Lett. 1997, 274, 145.
25. Gorman, C. B.; He, Y.; Carroll, R. L. Langmuir 2001, 17, 5324.
26. Ito, E.; Konno, K.; Noh, J.; Kanai, K.; Ouchi, Y.; Seki, K.; Hara, M. Appl. Surf. Sci. 2005, 244, 584.
27. Cossaro, A.;Mazzarello, R.;Rousseau, R.; Casalis, l; Verdini, A.;Kohlmeyer, A.; Floreano, L.; Scandolo, S.; Morgante, A.; Klein, M. L.; Scoles, G. Science 2008, 321 (5891), 943.
28. Fenter, P.; Eisenberger, P. Phys. Rev. Lett. 1993, 70 (16), 2447.
29. Hayashi, T.; Wakamatsu, K.; Ito, E.; Hara, M. J. Phys. Chem. 2009, 113, 18795.
30. Lee, J. G.; Lee, J.; Yates, J. T. J. Phys. Chem. B 2004, 108, 1686.
31. Lee, J. G.; Lee, J.; Yates, J. T. J. Am. Chem. Soc. 2004, 126, 440.
32. Rzeznicka, I. I.; Lee, J.; Maksymovych, P.; Yates, J. T. J. Phys. Chem. B 2005, 109, 15992.
33. Woodruff, D. P. Phys. Chem. Chem. Phys. 2008, 10, 7211.
34. Maksymovych, P.; Sorescu, D. C.; Yates, J. T. Phys. Rev. Lett. 2006, 97, 1461031.
35. Voznyy, O.; Dubowski, J. J.; Yates, J. T.; Maksymovych, P. J. Am. Chem. Soc. 2009, 131, 12989.
36. Kautz, N. A.; Kandel, S. A. J. Phys. Chem. C 2009, 113, 19286.
37. Frank, P.; Hlawacek, G.; Lengyel, O.; Satka, A.; Teichert, C.; Resel, R.; Winkler, A. Surf. Sci. 2007, 601, 2152.
38. 2) reacts violently with most organic materials and must be handled with extreme care.
39. http://www.sim4tec.com/?Products:LEEDsim-LEED-simulation-software.
40. Hobara, D.; Sasaki, T.; Imabayashi, S.; Kakiuchi, T. Langmuir 1999, 15, 5073.
41. Gerlach, R.; Polanski, G.; Rubahn, H.-G. Appl. Phys. A: Mater. Sci. Process. 1997, 65, 375.
42. Frank, P.; Nussbacher, F.; Stettner, J.; Winkler, A. In Interface controlled organic thin films, Rubahn, H. G., Sitter, H., Horowitz, G., Al-Shamery, K., Eds.; Plenum Press: Berlin, 2009; Vol. 129, p 107.
43. Redhead, P. A. Vacuum 1962, 12, 203.
44. Winkler, A. In Interface controlled organic thin films; Rubahn, H. G., Sitter, H., Horowitz, G., Al-Shamery, K., Eds.; Plenum Press: Berlin, 2009; Vol. 129, p 29.
45. Paserba, K. R.; Gellman, A. J. Phys. Rev. Lett. 2001, 86, 4338.
46. Müllegger, S.; Winkler, A. Surf. Sci. 2006, 600, 1290.
47. Tait, S. L.; Dohnalek, Z.; Campbell, C. T.; Kay, B. D. J. Chem. Phys. 2005, 122, 164708.
48. Stettner, J.; Frank, P.; Griesser, T.; Trimmel, G.; Schennach, R.; Gilli, E.; Winkler, A. Langmuir 2009, 25, 1427.
49. Voets, J.; Gerritsen, J. W.; Grimbergen, R. F.; van Kempen, H. Surf. Sci. 1998, 399, 316.
50. Edinger, K.;Gölzhäuser, A.; Demota, K.;Wöll, Ch.; Grunze, M. Langmuir 1993, 9, 4.