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Thin Solid Films

Volumn 518, Issue 22, 2010, Pages 6228-6231

Surface properties of etched ITO thin films using high density plasma

(5) Wi, Jae Hyung a Woo, Jong Chang a Um, Doo Seung a Kim, Junseong a Kim, Chang Il a

a Chung Ang University (South Korea)

Author keywords

AFM; BCl3 Ar; ICP; ITO; XPS

Indexed keywords

AFM; BCL3/AR; ICP; ITO; XPS;

ARGON; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; ETCHING; ION BOMBARDMENT; SURFACE PROPERTIES; SURFACE REACTIONS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ITO GLASS;

EID: 77956056943 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2010.03.166 Document Type: Conference Paper

Times cited : (7)

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