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Journal of Applied Physics

Volumn 108, Issue 3, 2010, Pages

Effect of composition on damage accumulation in ternary ZnO-based oxides implanted with heavy ions

(5) Azarov, A Yu a Svensson, B G a Halln A b Du, X L c Kuznetsov, A Yu a

a UNIVERSITY OF OSLO (Norway)

b ROYAL INSTITUTE OF TECHNOLOGY (Sweden)

c INSTITUTE OF PHYSICS (China)

Author keywords

[No Author keywords available]

Indexed keywords

DAMAGE ACCUMULATION; DOSE RANGE; FILM COMPOSITION; ION DOSE; METALORGANIC CHEMICAL VAPOR DEPOSITION; MG CONTENT; PURE ZNO; ROOM TEMPERATURE; RUTHERFORD BACKSCATTERING/CHANNELING; SUB-LATTICES; SURFACE DAMAGES; WURTZITES; ZNO;

EPITAXIAL GROWTH; ERBIUM; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MOLECULAR BEAM EPITAXY; MOLECULAR BEAMS; ORGANIC CHEMICALS; ORGANOMETALLICS; ZINC; ZINC OXIDE; ZINC SULFIDE;

IONS;

EID: 77955889842 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3467532 Document Type: Article

Times cited : (18)

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