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Volumn 13, Issue 10, 2010, Pages

On epitaxy of ultrathin Ni1-xPtx silicide films on Si(001)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECT-FREE; HIGHER TEMPERATURES; INHOMOGENEITIES; SHARP INTERFACE; SI(0 0 1); SILICIDE FILMS; THERMAL TREATMENT; ULTRA-THIN;

EPITAXIAL GROWTH; PLATINUM; SILICIDES; SILICON; STRUCTURAL ANALYSIS;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 77955748980 PISSN: 10990062 EISSN: None Source Type: Journal
DOI: 10.1149/1.3473723 Document Type: Article

Times cited : (11)

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