Surface-energy triggered phase formation and epitaxy in nanometer-thick Ni1-x Ptx silicide films

Applied Physics Letters

Volumn 96, Issue 3, 2010, Pages

  Luo, Jun ^a,b   Qiu, Zhijun ^b   Zha, Chaolin ^a   Zhang, Zhen ^a   Wu, Dongping ^b   Lu, Jun ^c   Åkerman, Johan ^a,d   Östling, Mikael ^a   Hultman, Lars ^c   Zhang, Shi Li ^a,b,e  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b FUDAN UNIVERSITY   (China)

^c LINKÖPING UNIVERSITY   (Sweden)

^d UNIVERSITY OF GOTHENBURG   (Sweden)

^e UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING BEHAVIOR; IN-PHASE; MORPHOLOGICAL STABILITY; NISI FILMS; PHASE FORMATIONS; POLYCRYSTALLINE; SILICIDE FILMS; SURFACE ENERGIES; ULTRA-THIN;

CRYSTAL GROWTH; PLATINUM; SILICIDES; SURFACE CHEMISTRY; SURFACE TENSION;

ULTRATHIN FILMS;

EID: 77949851089     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3291679     Document Type: Article

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