SCOPUS 정보 검색 플랫폼

Volumn 96, Issue 7, 2010, Pages

Morphological stability and specific resistivity of sub-10 nm silicide films of Ni1-x Ptx on Si substrate

(9) Zhang, Zhen a Zhang, Shi Li b Yang, Bin c Zhu, Yu a Rossnagel, Stephen M a Gaudet, Simon d Kellock, Andrew J e Jordan Sweet, Jean a Lavoie, Christian a,d

a IBM T J WATSON RESEARCH CENTER (United States)

b UPPSALA UNIVERSITY (Sweden)

c IBM MICROELECTRONICS (United States)

d ÉCOLE POLYTECHNIQUE DE MONTRÉAL (Canada)

e IBM ALMADEN RESEARCH CENTER (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALLOY SCATTERING; DEPOSITED METAL; ELECTRON MEAN FREE PATH; FILM RESISTIVITY; MORPHOLOGICAL STABILITY; SHARP INCREASE; SI (100) SUBSTRATE; SI SUBSTRATES; SILICIDE FILMS; SPECIFIC RESISTIVITIES;

PLATINUM; SILICIDES; SILICON; SILICON ALLOYS;

PLATINUM ALLOYS;

EID: 77249105519 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3323097 Document Type: Article

Times cited : (58)

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