Low temperature sol-gel metal oxide and fluoride layer stacks for optical applications

Thin Solid Films

Volumn 518, Issue 21, 2010, Pages 6080-6086

  Kruger H ^a,b   Hertwig, A ^b   Beck, U ^b   Kemnitz, E ^a  

^a HUMBOLDT UNIVERSITY   (Germany)

^b BAM FEDERAL INSTITUTE FOR MATERIALS RESEARCH AND TESTING   (Germany)

Author keywords

Magnesium fluoride; Optical layer stacks; Optical properties; Sol gel; Spin coating; Titanium oxide

Indexed keywords

DEPOSITED LAYER; FLUORIDE LAYERS; FUSED SILICA SUBSTRATES; LAYER STACKS; LAYER THICKNESS; LOW TEMPERATURES; MAGNESIUM FLUORIDE; METAL OXIDES; OPTICAL APPLICATIONS; OPTICAL LAYER STACKS; OPTICAL LAYERS; OPTICAL QUALITIES; REFLECTIVE LAYERS; SAMPLE HOMOGENEITY; SINGLE LAYER; SPECTROSCOPIC MAPPING; TEMPERATURE TREATMENTS; TIO; TRANSMISSION SPECTROSCOPY;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; COATINGS; ELLIPSOMETRY; EPITAXIAL GROWTH; FUSED SILICA; GELS; MAGNESIUM; MAGNESIUM COMPOUNDS; METALLIC COMPOUNDS; NANOSTRUCTURED MATERIALS; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; SILICA; SOL-GELS; SOLS; SPIN DYNAMICS; TITANIUM; TITANIUM OXIDES; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

SOL-GEL PROCESS;

EID: 77955558584     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.06.025     Document Type: Article

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