Influence of plasma ion-beam assistance on TiO2 and MgF2 thin films deposited by plasma ion-assisted deposition

Surface and Coatings Technology

Volumn 201, Issue 19-20 SPEC. ISS., 2007, Pages 8250-8257

  Woo, Seouk Hoon ^a   Hwangbo, Chang Kwon ^a  

^a Inha University   (South Korea)

Author keywords

MgF2 film; Plasma ion beam assisted deposition; Stress; TiO2 film

Indexed keywords

E-BEAM EVAPORATION; EXTINCTION COEFFICIENT; PLASMA ION-BEAM ASSISTED DEPOSITION;

COMPRESSIVE STRESS; LIGHT ABSORPTION; LIGHT EXTINCTION; MAGNESIUM COMPOUNDS; MICROCRACKS; OPTICAL COATINGS; REFRACTIVE INDEX; TENSILE STRESS; THIN FILMS; TITANIUM DIOXIDE;

PLASMA DEPOSITION;

COMPRESSIVE STRESS; LIGHT ABSORPTION; LIGHT EXTINCTION; MAGNESIUM COMPOUNDS; MICROCRACKS; OPTICAL COATINGS; PLASMA DEPOSITION; REFRACTIVE INDEX; TENSILE STRESS; THIN FILMS; TITANIUM DIOXIDE;

EID: 34447498698     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.01.085     Document Type: Article

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