Novel catalysts: Indium implanted SiO 2 thin films

Applied Surface Science

Volumn 257, Issue 1, 2010, Pages 192-196

  Yoshimura, S ^a   Hine, K ^a   Kiuchi, M ^a,b   Nishimoto, Y ^a   Yasuda, M ^a   Baba, A ^a   Hamaguchi, S ^a  

^a OSAKA UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Catalyst; Indium; Ion beam injection

Indexed keywords

CATALYSTS; INDIUM; INDUSTRIAL CHEMICALS; ION BEAMS; IONS; ORGANIC CHEMICALS; PARTICLE BEAM INJECTION; REACTION RATES; SILICA; SILICON OXIDES; SURFACE REACTIONS; THIN FILMS;

BEAM INJECTION; CATALYTIC ABILITY; HIGH-EFFICIENCY; INJECTION ENERGY; PREPARATION PROCESS; SIO2 THIN FILMS; SUBSTRATE SURFACE; SURFACE CHEMICAL REACTIONS;

FILM PREPARATION;

EID: 77955517902     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.06.063     Document Type: Article

References (10)

1. Y. Onishi, T. Ito, M. Yasuda, and A. Baba Eur. J. Org. Chem. 2002 1578 1581
2. T. Saito, M. Yasuda, and A. Baba Synlett 2005 1737 1739
3. U. Schneider, and S. Kobayashi Angew. Chem. Int. Ed. 46 2007 5909 5912
4. S. Solmi, A. Parisini, M. Bersani, D. Giubertoni, V. Sonicini, G. Carnevale, A. Benvenuti, and A. Marmiroli J. Appl. Phys. 92 2002 1361 1366
5. S. Gennaro, D. Giubertoni, M. Bersani, J. Foggiato, W.S. Yoo, and R. Gwilliam J. Vac. Sci. Technol. B 24 2006 473 477
6. T.S. Anderson, R.H. Magruder III, R.A. Weeks, and R.A. Zuhr J. Non-Cryst. Solids 203 1996 114 119
7. M.-A. Hasan, J. Knall, S.A. Barnett, A. Rockett, J.-E. Sundgren, and J.E. Greene J. Vac. Sci. Technol. B 5 1987 1332 1339
8. S. Yoshimura, A. Toh, S. Sugimoto, M. Kiuchi, and S. Hamaguchi Jpn. J. Appl. Phys. 45 2006 8204 8207
9. T. Matsumoto, K. Mimoto, S. Goto, M. Ohba, Y. Agawa, and M. Kiuchi Rev. Sci. Instrum. 71 2000 1168 1170
10. M. Yasuda, T. Somyo, and A. Baba Angew. Chem. Int. Ed. 45 2006 793 796