Effect of interlayer thickness on stress and dielectric properties of MgTiO3 modified (Ba,Sr)TiO3 multilayer thin films

Materials Science Forum

Volumn 654-656, Issue , 2010, Pages 1796-1799

  Lu, Shengbo ^a   Xu, Zhengkui ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

BST thin film; Dielectric properties; MT interlayer; Residual stress

Indexed keywords

DIELECTRIC PROPERTIES; DIELECTRIC PROPERTIES OF SOLIDS; FILM PREPARATION; LANTHANUM COMPOUNDS; MAGNESIUM COMPOUNDS; MULTILAYER FILMS; MULTILAYERS; NICKEL COMPOUNDS; PULSED LASER DEPOSITION; RESIDUAL STRESSES; SILICON COMPOUNDS; STRONTIUM COMPOUNDS; THERMAL EXPANSION;

BST THIN FILMS; FILM ORIENTATIONS; INTERLAYER THICKNESS; MT INTERLAYER; MULTI-LAYER THIN FILM; PREFERRED ORIENTATIONS; RANDOM ORIENTATIONS; THERMAL EXPANSION COEFFICIENTS;

DIELECTRIC MATERIALS;

EID: 77955490587     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/MSF.654-656.1796     Document Type: Conference Paper

References (17)

1. A. K. Tagantsev, V. O. Sherman, K. F. Astafiev, J. Venkatesh, N. Setter, Journal of Electroceramics 11 (2003) 5.
2. P. Bao, T. J. Jackson, X. Wang, M. J. Lancaster, J. Phys. D: Appl. Phys. 41 (2008) 063001.
3. J. F. Scott, Science 315 (2007) 954.
4. M. W. Cole, C. V. Weiss, E. Ngo, S. Hirsch, L. A. Coryell, S. P. Alpay, Appl. Phys. Lett. 92 (2008) 182906.
5. K. H. Yoon, J.-H. Sohn, B. D. Lee, D. H. Kang, Appl. Phys. Lett. 81 (2002) 5012.
6. X. Chou, J. Zhai, X. Yao, Appl. Phys. Lett. 91 (2007) 122908.
7. T. N. Lin, J. P. Chu, S. F. Wang, Mater. Lett. 59 (2005) 2786.
8. X. H. Zhu, B. Guigues, E. Defay, M. Aid, J. Appl. Phys. 104 (2008) 074118.
9. W. Fu, H. Wang, L. Cao, Y. Zhou, Appl. Phys. Lett. 92 (2008) 182910.
10. E. F. Alberta, R. Guo, A. S. Bhalla, Ferroelectrics 268 (2002) 169.
11. M. T. Sebastian, Dielectric Materials for Wireless Communications, Elsevier Science, Amsterdam, 2008.
12. L. Gao, J. W. Zhai, X. Yao, Z. K. Xu, J. Am. Ceram. Soc. 91 (2008) 3109.
13. S. J. Skrzypek, A. Baczmanski, W. Ratuszeka, E. Kusiorc, J. Appl. Cryst. 34 (2001) 427.
14. Z. G. Ban, S. P. Alpay, J. Appl. Phys. 91 (2002) 9288.
15. K.-S. Hwang, B.-A. Kang, Y.-S. Jeon, J.-H. An, B.-H. Kim, K. Nishio, T. Tsuchiya, Surface and Coatings Technology 190 (2005) 331.
16. L. B. Duk, L. H. Ryul, Y. K. Hyun, K. D. Heon, J. Am. Ceram. Soc. 88 (2005) 1197.
17. K. Morito, T. Suzuki, J. Appl. Phys. 97 (2005) 104107.7.