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Volumn 104, Issue 7, 2008, Pages
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Modeling of the evolution of dielectric loss with processing temperature in ferroelectric and dielectric thin oxide films
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS FILMS;
BARIUM;
CERAMIC CAPACITORS;
CRYSTAL GROWTH;
CRYSTALLINE MATERIALS;
DIELECTRIC DEVICES;
DIELECTRIC LOSSES;
FERROELECTRIC FILMS;
FERROELECTRICITY;
GRAIN BOUNDARIES;
GRAIN GROWTH;
KETONES;
THICK FILMS;
THIN FILMS;
TITANIUM OXIDES;
(BA , SR)TIO3 THIN FILM;
AMORPHOUS;
CRYSTALLINE GRAINS;
CRYSTALLIZATION PROCESSES;
DIELECTRIC RESPONSES;
EXPERIMENTAL DATUM;
GRAIN BOUNDARY DENSITIES;
INITIAL STAGES;
MODELING;
PROCESSING TEMPERATURES;
REASONABLE AGREEMENTS;
THIN OXIDE FILMS;
OXIDE FILMS;
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EID: 54049138001
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.2999638 Document Type: Article |
Times cited : (14)
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References (13)
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