Fabrication of rough Al doped ZnO films deposited by low pressure chemical vapor deposition for high efficiency thin film solar cells

Current Applied Physics

Volumn 10, Issue SUPPL. 3, 2010, Pages

  Kim, Doyoung ^a   Yun, Ilgu ^a   Kim, Hyungjun ^a  

^a Yonsei University   (South Korea)

Author keywords

Al doping; Low pressure chemical vapor deposition (LP CVD); Self textured; Solar cell; ZnO transparent conductive oxide

Indexed keywords

A-SI:H; AL DOPED ZNO THIN FILMS; AL DOPING; AL-DOPED ZNO; DIETHYLZINC; GLASS SUBSTRATES; HAZE FACTORS; HIGH EFFICIENCY; PURE WATER; SUPERSTRATES; TEXTURED SURFACE; THIN FILM SOLAR CELLS; TRANSPARENT CONDUCTIVE OXIDES; TRANSPARENT ELECTRODE; TRIMETHYLALUMINUM; ZNO; ZNO THIN FILM;

ALUMINUM; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; METALLIC FILMS; OPTICAL FILMS; SEMICONDUCTOR DOPING; SOLAR CELLS; SUBSTRATES; THIN FILMS; VAPOR DEPOSITION; ZINC; ZINC OXIDE;

DEPOSITION;

EID: 77955485072     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2010.02.030     Document Type: Conference Paper

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