Prediction of grain size, thickness and absorbance of nanocrystalline tin oxide thin film by Taguchi robust design

Solid State Sciences

Volumn 12, Issue 8, 2010, Pages 1323-1327

  Ebrahimiasl, Saeideh ^a   Zin Wan Yunus, Wan Md ^a   Kassim, Anuar ^a   Zainal, Zulkarnain ^a  

^a UNIVERSITY PUTRA MALAYSIA   (Malaysia)

Author keywords

Absorbance; Grain size; SnO2 nanocrystalline; Taguchi robust design; Thickness

Indexed keywords

ABSORBANCES; BATH TEMPERATURES; CRYSTALLINE SIZE; DEPOSITED LAYER; DEPOSITION CONDITIONS; DEPOSITION TIME; EXPERIMENTAL OBSERVATION; GLASS SUBSTRATES; GRAIN SIZE; MAIN PARAMETERS; MODEL PREDICTION; NANOCRYSTALLINES; PH VALUE; PROCESS PARAMETERS; TAGUCHI ANALYSIS; TAGUCHI ROBUST DESIGN; TIN OXIDE THIN FILM; TRANSPARENT CONDUCTIVE FILMS; UV VISIBLE SPECTROSCOPY;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; CONDUCTIVE FILMS; DEPOSITION; DESIGN; FORECASTING; GRAIN SIZE AND SHAPE; NANOCRYSTALLINE ALLOYS; OXIDE FILMS; SENSITIVITY ANALYSIS; SUBSTRATES; THIN FILMS; TIN; TITANIUM COMPOUNDS; ULTRAVIOLET SPECTROSCOPY; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

FILM THICKNESS;

EID: 77955429792     PISSN: 12932558     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solidstatesciences.2010.04.033     Document Type: Article

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