Impact of surface roughness on the electrical parameters of industrial high efficiency NaOH-NaOCl textured multicrystalline silicon solar cell

Solar Energy

Volumn 84, Issue 9, 2010, Pages 1658-1665

  Basu, P K ^a   Pujahari, R M ^a,b   Kaur, Harpreet ^b,c   Singh, Devi ^b   Varandani, D ^d   Mehta, B R ^d  

^a Echelon Institute of Technology   (India)

^b MANAV RACHNA INTERNATIONAL INSTITUTE OF RESEARCH AND STUDIES   (India)

^c Advanced Institute of Technology and Management   (India)

^d INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

Author keywords

AFM study; Cell LIV and DIV characteristics; HF HNO3 CH3COOH texturization; Multicrystalline large area silicon solar cell; NaOH NaOCl texturization; Reflectivity study

Indexed keywords

AFM; MULTICRYSTALLINE; MULTICRYSTALLINE LARGE AREA SILICON SOLAR CELL; NAOH-NAOCL TEXTURIZATION; TEXTURIZATION;

ATOMIC FORCE MICROSCOPY; CYTOLOGY; HYDROFLUORIC ACID; POLYSILICON; REFLECTION; SILICON NITRIDE; SILICON SOLAR CELLS; SILICON WAFERS; SODIUM; SOLAR CELLS; SURFACE PROPERTIES; SURFACE ROUGHNESS;

CELLS;

COMPARATIVE STUDY; SILICON; SURFACE ROUGHNESS; WAVELENGTH;

EID: 77955417606     PISSN: 0038092X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solener.2010.06.001     Document Type: Article

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