High quality shadow masks for top contact organic field effect transistors using deep reactive ion etching

Journal of Micromechanics and Microengineering

Volumn 20, Issue 7, 2010, Pages

  Aljada, Muhsen ^a   Mutkins, Karyn ^a   Vamvounis, George ^a   Burn, Paul ^a   Meredith, Paul ^a  

^a UNIVERSITY OF QUEENSLAND   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

CHANNEL WIDTHS; CONTACT MASKS; DEEP REACTIVE ION ETCHING; HIGH QUALITY; MASK FABRICATION; NANO SCALE; ORGANIC MATERIALS; SHADOW MASK; SHARP EDGES; TOP CONTACT;

FABRICATION; FIELD EFFECT TRANSISTORS; MASKS; ORGANIC FIELD EFFECT TRANSISTORS; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS;

REACTIVE ION ETCHING;

EID: 77955352849     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/20/7/075037     Document Type: Article

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