SCOPUS 정보 검색 플랫폼

Japanese Journal of Applied Physics

Volumn 49, Issue 6 PART 2, 2010, Pages

Durability enhancement of a microelectromechanical system-based liquid droplet lens

(4) Lee, June Kyoo a Park, Kyung Woo a Kim, Hak Rin a Kong, Seong Ho a

a Kyungpook National University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CONCENTRATION OF; DIELECTRIC LAYER; ELECTRO WETTING; ELECTROSTATIC STRESS; ISOTROPIC ETCHING; LIQUID DROPLETS; MICRO ELECTRO MECHANICAL SYSTEM; MICROELECTROMECHANICAL SYSTEMS; OXIDE LAYER; ROUNDED CORNERS; SILICON DIOXIDE LAYERS; SILICON WET ETCHING; SIMULATED RESULTS; TRUNCATED PYRAMIDS;

COMPOSITE MICROMECHANICS; DROP FORMATION; DURABILITY; LIQUIDS; MECHATRONICS; MEMS; MICROELECTROMECHANICAL DEVICES; OPTICAL INSTRUMENTS; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA; WET ETCHING; WETTING;

ELECTROSTATIC LENSES;

EID: 77955325294 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.49.06GN11 Document Type: Article

Times cited : (6)

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