The ALU+ concept: N-type silicon solar cells with surface-passivated screen-printed aluminum-alloyed rear emitter

IEEE Transactions on Electron Devices

Volumn 57, Issue 8, 2010, Pages 1966-1971

  Bock, Robert ^a   Schmidt, Jan ^a   Mau, Susanne ^a   Hoex, Bram ^b   Brendel, Rolf ^a  

^a INSTITUTE FOR SOLAR ENERGY RESEARCH HAMELIN ISFH   (Germany)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Aluminium oxide; amorphus silicon; atomic layer deposition; emitter passivation; n type silicon; passivation; photovoltaic cells; screen printed emitter

Indexed keywords

ALUMINIUM OXIDE; ALUMINUM OXIDES; AMORPHOUS SILICON (A-SI); AMORPHUS SILICON; ATOMIC LAYER DEPOSITED; CONVEYOR BELTS; DOUBLE LAYERS; EMITTER SATURATION CURRENT DENSITY; HIGH EFFICIENCY; N TYPE SILICON; P-TYPE; SCREEN-PRINTED; SOLAR CELL STRUCTURES;

ALUMINUM; ALUMINUM COATINGS; ATOMIC LAYER DEPOSITION; ATOMS; BELT CONVEYORS; CHEMICAL VAPOR DEPOSITION; CONVERSION EFFICIENCY; OXIDES; PASSIVATION; PHOTOELECTROCHEMICAL CELLS; PHOTOVOLTAIC CELLS; SILICON NITRIDE; SOLAR CELLS;

AMORPHOUS SILICON;

EID: 77955137891     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2010.2050953     Document Type: Article

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