SCOPUS 정보 검색 플랫폼

Volumn 4, Issue SUPPL.1, 2007, Pages

Inert gas admixtures in PECVD of titanium dioxide thin films on polymers - Influence on the UV absorptance of the films

(2) Sonnenfeld, Axel a von Rohr, Philipp Rudolf a

Author keywords

Argon; Nitrogen; Plasma enhanced chemical vapour deposition (PECVD); Polymeric substrate; Titanium dioxide; Titanium(IV) isopropoxide (TTIP); UV absorption

Indexed keywords

ABSORPTANCE; ABSORPTION COEFFICIENTS; CUTOFF WAVELENGTHS; ISO-PROPOXIDE; LOW PRESSURES; PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION (PECVD); POLYMERIC SUBSTRATE; RADIO FREQUENCY DISCHARGES; TITANIUM DIOXIDE THIN FILM; UV ABSORPTION;

ARGON; ELECTRIC DISCHARGES; GAS ABSORPTION; GAS MIXTURES; INERT GASES; LIGHT ABSORPTION; OXIDES; OXYGEN; PLASMA DEPOSITION; PLASMAS; POLYMERS; TITANIUM; TITANIUM DIOXIDE;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 70349432368 PISSN: 16128850 EISSN: 16128869 Source Type: Journal
DOI: 10.1002/ppap.200730404 Document Type: Conference Paper

Times cited : (1)

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