DC magnetron sputtering deposition of titanium oxide nanoparticles: Influence of temperature, pressure and deposition time on the deposited layer morphology, the wetting and optical surface properties

Plasma Processes and Polymers

Volumn 6, Issue SUPPL. 1, 2009, Pages

  Dreesen, Laurent ^a   Cecchet, Francesca ^b   Lucas, Stéphane ^b  

^a UNIVERSITY OF LIÈGE   (Belgium)

^b UNIVERSITY OF NAMUR   (Belgium)

Author keywords

Nanostructures; Optical properties; Physical vapour deposition; Surface morphology; Wettability

Indexed keywords

ADSORBED LAYERS; BLUE-SHIFTED; DC MAGNETRON SPUTTERING; DEPOSITED LAYER; DEPOSITION PARAMETERS; DEPOSITION TEMPERATURES; DEPOSITION TIME; ENERGY BANDGAPS; GLASS SUBSTRATES; HYDROPHILIC PROPERTIES; OPTICAL SURFACES; PHYSICAL VAPOUR DEPOSITION; PRESSURE INCREASE; REACTIVE DC MAGNETRON SPUTTERING; SURFACE COVERAGES; TITANIUM DIOXIDE NANOPARTICLES; TOTAL PRESSURE; ULTRAVIOLET ILLUMINATION; UV LIGHT;

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CONTACT ANGLE; DEPOSITION; HYDROPHILICITY; MORPHOLOGY; NANOPARTICLES; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SURFACE PROPERTIES; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES; ULTRAVIOLET SPECTROSCOPY; ULTRAVIOLET VISIBLE SPECTROSCOPY;

SURFACE MORPHOLOGY;

EID: 77954911171     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200932201     Document Type: Conference Paper

References (27)

1. A. Fujishima, K. Honda, Nature 1972, 238, 37.
2. N. P. Melott, C. Durucan, C. G. Pantano, M. Gugliemi, Thin Solid Films 2005, 502, 112.
3. P. Evans, D. W. Sheel, Surf. Coat. Technol 2007, 201, 9319.
4. K. Yeung, Y. Lam, Thin Solid Films 1983, 109, 169.
5. K. L. Siefering, G. L. Griffin, J. Electrochem. Soc. 1990, 137, 1206.
6. K. Bange, C. R. Otterrnann, O. Anderson, U. Jeschkowski, M. Laube, R. Feile, Thin Solid Films 1991, 198, 211.
7. Y. Sawada, Y. Taga, Thin Solid Films 1984, 116, L55.
8. X. H. Wang, J.-G. Li, H. Kamiyama, T. Ishigaki, Thin Solid Films 2006, 506-507, 278.
9. M. Schneider, J. Baiker, J. Mater. Chem. 1992, 2, 587.
10. C. Cheng, J. Ma, Z. Zhao, L. Qi, Chem. Mater. 1995, 7, 663.
11. W. Thongsuwan, T. Kumpika, P. Singjai, Curr. Appl. Phys. 2007, 8, 563.
12. E. Figgemeier, W. Kylberg, E. Constable, M. Scarisoreanu, R. Alexandrescu, I, Morjan, I. Soare, R. Birjega, E. Opovici, C. Fleaca, L. Gavrila-Florescu, G. Prodan, Appl. Surf. Sci. 2007, 254, 1037.
13. T. Seto, Y. Kawakami, N. Suzuki, M. Hirasawa, S. Kano, N. Aya, S. Sasaki, H. Shimura, J. Nanoparticles Res. 2001, 3, 185.
14. A. Ranga Rao, V. Dutta, Sol. Energ. Mater. Sol. Cell. 2007, 91, 1075.
15. Y. Sun, A. Li, M. Qi, L. Zhang, X. Yao, Mater. Sci. Eng. 2001, B86, 185.
16. J.-G. Li, M. Ikeda, Y. Moriyoshi, T. Ishigaki, J. Phys. D: Appl. Phys 2007, 40, 2348.
17. L. Dreesen, J.-F. Colomer, H. Limage, A. Giguère, S. Lucas, Thin Solid Films, revision submitted.
18. R. Gouttebaron, D. Comelissen, R. Snyders, J. P. Dauchot, M. Wautelet, M. Hecq, Surf. Int. Anal 2000, 30, 527.
19. M. Rasa, B. W. M. Kuipers, A. P. Philipse, J. Colloid Interfi Sci. 2002, 250, 303.
20. M. C. Barnes, S. Kumar, L. Green, N.-M. Hwang, A. R. Gerson, Surf. Coat. Technol 2005, 190, 321.
21. M. C. Barnes, A. R. Gerson, S. Kumar, N.-M. Hwang, Thin Solid Films 2004, 446, 29.
22. H. Tang, K. Prasad, R. Sanjines, P. E. Schmid, F. Lévy, J. Appl. Phys. 1994, 75, 2042.
23. D. Mardare, F. Iacomi, D. Luca, Thin Solid Films 2007, 515, 6464.
24. N. Daude, C. Gout, C. Jounain, Phys. Rev. B 1977, 15, 3229.
25. Q. Ye, P. Y. Liu, Z. F. Tang, L. Zhai, Vacuum 2007, 81, 627.
26. D. Glö, P. Frac, O. Zywitzki, T. Modes, S. Klinkenbeg, C. Gottfried, Surf. Coat. Technol 2005, 200, 967.
27. T. M. Wang, S. K. Zheng, W. C. Hao, C. Wang, Surf. Coat. Technol 2002, 155, 141.