Application of pressure-cycle purge (PCP) in dry-down of ultra-high-purity gas distribution systems

Chemical Engineering Science

Volumn 65, Issue 17, 2010, Pages 5041-5050

  Yao, Junpin ^a   Wang, Hao ^a   Dittler, Roy ^a   Geisert, Carl ^b   Shadman, Farhang ^a  

^a University of Arizona   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

Adsorption; Cycle purge; Desorption; Dynamic simulation; Mathematical modeling; Moisture

Indexed keywords

ADSORPTION CYCLE; ADSORPTION/DESORPTION; CONSTANT PRESSURES; CONTROLLED FREQUENCY; DESORPTION DYNAMICS; DISTRIBUTION SYSTEMS; EXPERIMENTAL INVESTIGATIONS; GAS DISTRIBUTION; GASPHASE; HIGH COSTS; IN-PROCESS; INDUSTRIAL SCALE SYSTEMS; INNER SURFACES; MANUFACTURING PLANT; MATHEMATICAL MODELING; MOISTURE CONTENTS; MOISTURE MOLECULES; MOLECULAR CONTAMINANTS; OPERATING CONDITION; OPERATIONAL PARAMETERS; PARAMETRIC STUDY; POINT-OF-USE; PRESSURE VARIATIONS; PROCESS MODEL; PROCESS OPTIMIZATION; PROCESS SIMULATIONS; PROCESS SIMULATORS; PURGE GAS; PURGE TIME; SEMICONDUCTOR MANUFACTURERS; STRONG INTERACTION; TRACE AMOUNTS; ULTRA HIGH PURITY;

ADSORPTION; COMPUTER SIMULATION; COST REDUCTION; DESORPTION; EQUIPMENT TESTING; INDUSTRIAL APPLICATIONS; LOCAL AREA NETWORKS; MOISTURE; OPTIMIZATION; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICES;

GASES;

EID: 77954658519     PISSN: 00092509     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ces.2010.06.002     Document Type: Article

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