Theoretical analysis of 157-nm hard pellicle system purification via a cyclic purge/fill process

Journal of Microlithography, Microfabrication and Microsystems

Volumn 3, Issue 1, 2004, Pages 122-129

  Nellis, Gregory F ^a   Abdo, Amr Y ^a   Engelstad, Roxann L ^a   Cotte, Eric P ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

157 nm lithography; Finite element modeling; Hard pellicle stress; Pellicle nitrogen purging; Theoretical analysis

Indexed keywords

157-NM LITHOGRAPHY; HARD PELLICLE STRESS; PELLICLE NITROGEN PURGING; THEORETICAL ANALYSIS;

FINITE ELEMENT METHOD; IMAGING TECHNIQUES; MATHEMATICAL MODELS; PURGING; PURIFICATION; RADIATION; SEMICONDUCTOR MATERIALS; VOLUME MEASUREMENT;

LITHOGRAPHY;

EID: 2542450061     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1630313     Document Type: Article

References (5)

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