Contamination issues in gas daivery for semiconductor processing

IEEE Transactions on Semiconductor Manufacturing

Volumn 10, Issue 2, 1997, Pages 273-278

  Krishnan, Sowmya ^a   Laparra, Olivier ^b  

^a Ultra Clean Technology   (United States)

^b PHILIPS RESEARCH LABORATORIES   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINATION; DESORPTION; MASS SPECTROMETERS; MOISTURE; OXYGEN; PARTICLES (PARTICULATE MATTER);

ATMOSPHERIC PRESSURE IONIZATION MASS SPECTROMETERS (APIMS); GAS DELIVERY SYSTEMS; HEAT AFFECTED ZONE (HAZ);

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031139409     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.572082     Document Type: Article

References (9)

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