Temperature dependence of the electrical resistivity and the anisotropic magnetoresistance (AMR) of electrodeposited Ni-Co alloys

European Physical Journal B

Volumn 75, Issue 2, 2010, Pages 167-177

  Toth B G ^a,b   Peter L ^a   Revesz A ^b   Padar J ^a   Bakonyi, I ^a  

^a INSTITUTE OF EXPERIMENTAL MEDICINE   (Hungary)

^b EÖTVÖS LORÁND UNIVERSITY   (Hungary)

Author keywords

[No Author keywords available]

Indexed keywords

ALLOY COMPOSITIONS; ANISOTROPIC MAGNETORESISTANCE; AS-DEPOSITED STATE; AVERAGE GRAIN SIZE; COMPOSITION DEPENDENCE; COMPOSITION RANGES; CONCENTRATION RANGES; CU UNDERLAYERS; ELECTRICAL RESISTIVITY; EXPERIMENTAL DATA; FACE CENTERED CUBIC STRUCTURE; GRAIN SIZE; LIMITING VALUES; LITERATURE DATA; LOW TEMPERATURES; NI-CO ALLOY; PURE COMPONENTS; QUANTITATIVE AGREEMENT; RESISTIVITY VALUES; ROOM TEMPERATURE; SI WAFER; TEMPERATURE DEPENDENCE; THEORETICAL CALCULATIONS; THEORETICAL STUDY; TRANSPORT PARAMETERS; X-RAY DIFFRACTION STUDIES; ZERO-FIELD RESISTIVITY;

ALLOYING; ALLOYS; ANISOTROPY; ANNEALING; CHROMIUM; COBALT ALLOYS; CRYSTAL STRUCTURE; DEPOSITS; ELECTRIC CONDUCTIVITY; ELECTRIC RESISTANCE; ELECTRODEPOSITION; GRAIN SIZE AND SHAPE; MAGNETIC FIELD EFFECTS; MAGNETOELECTRONICS; MAGNETORESISTANCE; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; STRIPPING (DYES); X RAY DIFFRACTION;

CERIUM ALLOYS;

EID: 77954564486     PISSN: 14346028     EISSN: 14346036     Source Type: Journal    
DOI: 10.1140/epjb/e2010-00132-4     Document Type: Article

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