Growth and characterisation of thin MgO layers on Si(100) surfaces

Journal of Physics: Conference Series

Volumn 100, Issue PART 4, 2008, Pages

  Casey, P ^a,b   Hughes, G ^a,b   O'connor, E ^c   Long, R D ^c   Hurley, P K ^c  

^a DUBLIN CITY UNIVERSITY   (Ireland)

^b DUBLIN CITY UNIVERSITY   (Ireland)

^c UNIVERSITY COLLEGE CORK   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; BINDING ENERGY; BINS; CHEMICAL ANALYSIS; CORE LEVELS; DEPOSITION; FILM PREPARATION; FILM THICKNESS; MAGNESIA; OXIDE FILMS; OXYGEN; PALLADIUM; SILICON; SUBSTRATES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY; FILM GROWTH; NANOSCIENCE; OXIDE MINERALS; VACUUM APPLICATIONS;

CAPACITOR STRUCTURES; ELECTRICAL CHARACTERISATION; ELECTRICAL CHARACTERISTIC; ELECTRON BEAM EVAPORATION; FILM GROWTH MECHANISM; HYDROGEN-TERMINATED SILICON SURFACES; MAGNESIUM HYDROXIDE; SUBSTRATE TEMPERATURE;

FILM GROWTH; SILICON COMPOUNDS;

EID: 77954332803     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/100/4/042046     Document Type: Conference Paper

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