Direct measurement of sidewall roughness on Si, poly-Si and poly-SiGe by AFM

Journal of Physics: Conference Series

Volumn 100, Issue PART 6, 2008, Pages

  Gudmundsson, Valur ^a   Hellström, Per Erik ^a   Zhang, Shi Li ^a   Östling, Mikael ^a  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DRY ETCHING; GERMANIUM; LIGHT SCATTERING; PHOTORESISTS; ROUGHNESS MEASUREMENT; SILICON; SILICON ALLOYS; NANOCRYSTALLINE MATERIALS; NANOSCIENCE; POLYCRYSTALLINE MATERIALS; SURFACE ROUGHNESS;

DIRECT MEASUREMENT; I-LINE LITHOGRAPHY; LINE EDGE ROUGHNESS; POLYCRYSTALLINE-SI; ROUGH SURFACES; SAMPLE PREPARATION TECHNIQUES; SIDEWALL ROUGHNESS; SINGLE-CRYSTALLINE;

POLYCRYSTALLINE MATERIALS; SILICON;

EID: 77954331895     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/100/6/062021     Document Type: Conference Paper

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