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Chemical Vapor Deposition

Volumn 16, Issue 4-6, 2010, Pages 151-156

Synthesis of gallium nitride nanoparticles by microwave plasma-enhanced CVD

(3) Shimada, Manabu a Wang, Wei Ning a Okuyama, Kikuo a

a HIROSHIMA UNIVERSITY (Japan)

Author keywords

Gas phase synthesis; III V materials; Light emitting diode; Monodispersed particles; Semiconductor

Indexed keywords

ANTENNA LENGTH; AVERAGE SIZE; CVD METHOD; GALLIUM NITRIDE NANOPARTICLES; GAS-PHASE SYNTHESIS; HIGH CRYSTALLINITY; IMPROVED PROCESS; INPUT POWER; MICROWAVE PLASMA; MICROWAVE PLASMA-ENHANCED CVD; MONODISPERSED PARTICLES; NARROW SIZE DISTRIBUTIONS; NEGATIVE CHARGE; OPERATING CONDITION; PHOTOLUMINESCENCE PROPERTIES; PLASMA PROCESS; STOICHIOMETRIC RATIO; WELL-DISPERSED;

GALLIUM NITRIDE; LIGHT EMISSION; LIGHT EMITTING DIODES; MICROWAVES; NANOPARTICLES; PLASMAS; SEMICONDUCTOR DIODES;

GALLIUM ALLOYS;

EID: 77954321671 PISSN: 09481907 EISSN: 15213862 Source Type: Journal
DOI: 10.1002/cvde.200906811 Document Type: Article

Times cited : (18)

References (26)

1
- 0032516703
- S. Nakamura, Science 1998, 281, 956.
- (1998) Science , vol.281 , pp. 956
- Nakamura, S.¹

2
- 0030975368
- F. A. Ponce, D. P. Bour, Nature 1997, 386, 351.
- (1997) Nature , vol.386 , pp. 351
- Ponce, F.A.¹ Bour, D.P.²

3
- 19744374735
- E. F. Schubert, J. K. Kim, Science 2005, 308, 1274.
- (2005) Science , vol.308 , pp. 1274
- Schubert, E.F.¹ Kim, J.K.²

4
- 0001887693
- D. A. Neumayer, J. G. Ekerdt, Chem. Mater. 1996, 8, 9.
- (1996) Chem. Mater. , vol.8 , pp. 9
- Neumayer, D.A.¹ Ekerdt, J.G.²

5
- 0030036586
- Y. Xie, Y. T. Qian,W. Z. Wang, S. Y. Zhang, Y. H. Zhang, Science 1996, 272, 1926.
- (1996) Science , vol.272 , pp. 1926
- Xie, Y.¹ Qian, Y.T.² Wang, Z.³ Zhang, S.Y.⁴ Zhang, Y.H.⁵

6
- 1842483544
- K. Sardar, C. N. R. Rao, Adv. Mater. 2004, 16, 425.
- (2004) Adv. Mater. , vol.16 , pp. 425
- Sardar, K.¹ Rao, C.N.R.²

7
- 0242587354
- O. I. Micic, S. P. Ahrenkiel, D. Bertram, A. J. Nozik, Appl. Phys. Lett. 1999, 75, 478.
- (1999) Appl. Phys. Lett. , vol.75 , pp. 478
- Micic, O.I.¹ Ahrenkiel, S.P.² Bertram, D.³ Nozik, A.J.⁴

8
- 0033903884
- A. Manz, A. Birkner, M. Kolbe, R.A. Fischer, Adv.Mater. 2000, 12, 569.
- (2000) Adv.Mater , vol.12 , pp. 569
- Manz, A.¹ Birkner, A.² Kolbe, M.³ Fischer, R.A.⁴

9
- 84956227761
- H. M. Manasevit, F. M. Erdmann, W. I. Simpson, J. Electrochem. Soc. 1971, 118, 1864.
- (1971) J. Electrochem. Soc. , vol.118 , pp. 1864
- Manasevit, H.M.¹ Erdmann, F.M.² Simpson, W.I.³

10
- 1142268966
- Y. Azuma, M. Shimada, K. Okuyama, Chem. Vap. Deposition 2004, 10, 11.
- (2004) Chem. Vap. Deposition , vol.10 , pp. 11
- Azuma, Y.¹ Shimada, M.² Okuyama, K.³

11
- 27544488702
- Y. Azuma, M. Shimada, K. Okuyama, J. Chem. Eng. Jpn. 2005, 38, 516.
- (2005) J. Chem. Eng. Jpn. , vol.38 , pp. 516
- Azuma, Y.¹ Shimada, M.² Okuyama, K.³

12
- 33747240129
- D. Vollath, D. V. Szabo, J. Nanoparticle Res. 2006, 8, 417.
- (2006) J. Nanoparticle Res. , vol.8 , pp. 417
- Vollath, D.¹ Szabo, D.V.²

13
- 31544454994
- M. Shimada, Y. Azuma, K. Okuyama, Y. Hayashi, E. Tanabe, Jpn. J. Appl. Phys. 2006, 45, 328.
- (2006) Jpn. J. Appl. Phys. , vol.45 , pp. 328
- Shimada, M.¹ Azuma, Y.² Okuyama, K.³ Hayashi, Y.⁴ Tanabe, E.⁵

14
- 40249103317
- Y. Hayashi, M. Shimada, K. Okuyama, J. Chem. Eng. Jpn. 2008, 41, 62.
- (2008) J. Chem. Eng. Jpn. , vol.41 , pp. 62
- Hayashi, Y.¹ Shimada, M.² Okuyama, K.³

15
- 34748921164
- L. Mangolini, U. Kortshagen, Adv. Mater. 2007, 19, 2513.
- (2007) Adv. Mater. , vol.19 , pp. 2513
- Mangolini, L.¹ Kortshagen, U.²

16
- 17444400817
- B. Giesen,H.Wiggers,A. Kowalik, P. Roth, J. Nanoparticle Res. 2005, 7, 29.
- (2005) J. Nanoparticle Res. , vol.7 , pp. 29
- Giesen, B.¹ Wiggers, H.² Kowalik, A.³ Roth, P.⁴

17
- 0003934778
- John Wiley & Sons, New York
- A. Bouchoule, Dusty Plasmas: Physics, Chemistry, and Technological Impacts in Plasma Processing, 1999, John Wiley & Sons, New York.
- (1999) Dusty Plasmas: Physics, Chemistry, and Technological Impacts in Plasma Processing
- Bouchoule, A.¹

18
- 0003730831
- Wiley, New York
- M. A. Lieberman, A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing, Wiley, New York 1994.
- (1994) Principles of Plasma Discharges and Materials Processing
- Lieberman, M.A.¹ Lichtenberg, A.J.²

19
- 0032665861
- A. Kono, J. Phys. D: Appl. Phys. 1999, 32, 1357.
- (1999) J. Phys. D: Appl. Phys. , vol.32 , pp. 1357
- Kono, A.¹

20
- 0000448662
- H. D. Li, H. B. Yang, S. Yu, G. T. Zou, Y. D. Li, S. Y. Liu, S. R. Yang, Appl. Phys. Lett. 1996, 69, 1285.
- (1996) Appl. Phys. Lett. , vol.69 , pp. 1285
- Li H. B. Yang, H.D.¹ Yu, S.² Zou, G.T.³ Li, Y.D.⁴ Liu, S.Y.⁵ Yang, S.R.⁶

21
- 19944388604
- S. C. Hung, Y. K. Su, S. J. Chang, S. C. Chen, T. H. Fang, L. W. Ji, Physica E. 2005, 28, 115.
- (2005) Physica E. , vol.28 , pp. 115
- Hung, S.C.¹ Su, Y.K.² Chang, S.J.³ Chen, S.C.⁴ Fang, T.H.⁵ Ji, L.W.⁶

22
- 22144460497
- A. Kawabata, R. Kubo, J. Phys. Soc. Jpn. 1966, 21, 1765.
- (1966) J. Phys. Soc. Jpn. , vol.21 , pp. 1765
- Kawabata, A.¹ Kubo, R.²

23
- 12744259824
- A. Bapat, C. Anderson, C. R. Perrey, C. B. Carter, S. A. Campbell, U. Kortshagen, Plasma Phys. Control. Fusion 2004, 46, B97.
- (2004) Plasma Phys. Control. Fusion , vol.46
- Bapat, A.¹ Anderson, C.² Perrey, C.R.³ Carter, C.B.⁴ Campbell, S.A.⁵ Kortshagen, U.⁶

24
- 0000916543
- K. E. Gonsalves, S. P. Rangarajan, G. Carlson, J. Kumar, K. Yang, M. Benaissa, M. José-Yacamán, Appl. Phys. Lett. 1997, 71, 2175.
- (1997) Appl. Phys. Lett. , vol.71 , pp. 2175
- Gonsalves, S.P.¹ Rangarajan, K.E.² Carlson, G.³ Kumar, J.⁴ Yang, K.⁵ Benaissa, M.⁶ José-Yacamán, M.⁷

25
- 0037431254
- J. Goldberger, R. R. He, Y. F. Zhang, S.W. Lee, H. Q. Yan, H. J. Choi, P. D. Yang, Nature 2003, 422, 599.
- (2003) Nature , vol.422 , pp. 599
- Goldberger, J.¹ He, R.R.² Zhang, Y.F.³ Lee, S.W.⁴ Yan, H.Q.⁵ Choi, H.J.⁶ Yang, P.D.⁷

26
- 0034315370
- K. S. Kim, S. H. Kim, J. Vac. Sci. Technol. A 2000, 18, 2847.
- (2000) J. Vac. Sci. Technol. A , vol.18 , pp. 2847
- Kim, K.P.¹ Kim, S.H.²

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