Characterization of thin and ultrathin transparent conducting oxide (TCO) films and TCO-Si interfaces with XPS, TEM and ab initio modeling

Surface and Interface Analysis

Volumn 42, Issue 6-7, 2010, Pages 874-877

  Diplas, S ^a   Lovvik O M ^a,b   Nordmark, H ^a   Kepaptsoglou, D M ^b   Moe Graff, J ^a   Ladam, C ^b   Tyholdt, F ^a   Walmsley, J C ^a   Gunnaes, A E ^b   Fagerberg, R ^a   Ulyashin, A ^a  

^a SINTEF MATERIALS AND CHEMISTRY   (Norway)

^b UNIVERSITY OF OSLO   (Norway)

Author keywords

DFT; Interfaces; ITO; TEM; Thin films; XPS; ZnO

Indexed keywords

AB INITIO MODELING; AS ANNEALING; DEPOSITION TEMPERATURES; DFT; ELEVATED TEMPERATURE; HETEROSTRUCTURES; INDIUM TIN OXIDE; INTERFACIAL OXIDES; PLD DEPOSITION; SI SUBSTRATES; SI(1 0 0); TEM; TRANSPARENT CONDUCTING OXIDE FILMS; ULTRA-THIN; XPS; ZNO;

CONDUCTIVE FILMS; DANGLING BONDS; DENSITY FUNCTIONAL THEORY; ELECTRON BEAMS; ETCHING; INDIUM; LASER THEORY; OXIDE FILMS; PULSED LASER DEPOSITION; PULSED LASERS; SCANNING ELECTRON MICROSCOPY; SILICON; TIN; TIN OXIDES; TITANIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; ULTRATHIN FILMS; VACUUM EVAPORATION; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

ITO GLASS;

EID: 77954302260     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.3355     Document Type: Conference Paper

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