Low-cost x-ray mask based on micropattern sputtered lead film for x-ray lithography

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 27, Issue 3, 2009, Pages 1299-1303

  Mongpraneet, S ^a   Wisitsora At, A ^a   Phatthanakun, R ^b,c   Chomnawang, N ^b,c   Tuantranont, A ^a  

^a NATIONAL ELECTRONICS AND COMPUTER TECHNOLOGY CENTER   (Thailand)

^b National Synchrotron Research Center   (Thailand)

^c SURANAREE UNIVERSITY OF TECHNOLOGY   (Thailand)

Author keywords

[No Author keywords available]

Indexed keywords

GOLD DEPOSITS; LEAD; MASKS; MICROCHANNELS; PHOTORESISTS; STAINLESS STEEL; SURFACE TREATMENT; THICK FILMS; X RAYS;

ABSORBING LAYERS; COMMERCIAL APPLICATIONS; FILM DEPOSITION; LAYER THICKNESS; LEAD FILMS; LITHOGRAPHIC QUALITY; LOW COSTS; MICRO PATTERN; MICROFLUIDIC CHIP; NEGATIVE PHOTORESISTS; SIDEWALL ANGLES; SPUTTERING YIELDS; STAINLESS STEEL SUBSTRATES; SU-8 PHOTORESIST; THAILAND; X RAY MASK; X-RAY SOURCES;

X RAY LITHOGRAPHY;

EID: 77953909798     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3117259     Document Type: Conference Paper

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