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Microsystem Technologies

Volumn 4, Issue 2, 1998, Pages 66-69

High precision, low cost mask for deep x-ray lithography

(5) Shew, B Y a Cheng, Y a Shih, W P b Lu, M c Lee, W H d

a NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER (Taiwan)

b NATIONAL TSING HUA UNIVERSITY (Taiwan)

c NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

d NATIONAL TAIWAN UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0042295744 PISSN: 09467076 EISSN: None Source Type: Journal
DOI: 10.1007/s005420050097 Document Type: Article

Times cited : (7)

References (10)

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- (1980) Synchrotron Radiation Research , pp. 11-25
- Winick, H.¹

2
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- Micromachining program status at the SRRC
- Microsystem Technologies, printing
- Cheng Y; Shew B-Y; Shih W-P; Wang SS; Lin CY; Yang W-K; Lu M; Lee WH: (1997) Micromachining program status at the SRRC, Harmst 97, Microsystem Technologies, printing
- (1997) Harmst 97
- Cheng, Y.¹ Shew, B.-Y.² Shih, W.-P.³ Wang, S.S.⁴ Lin, C.Y.⁵ Yang, W.-K.⁶ Lu, M.⁷ Lee, W.H.⁸

3
- 0004093537
- chap. 2, 2nd edition, Washington DC, ACS Profesional Reference Book
- Bowden MJ: (1994) Introduction to microlithography, chap. 2, p. 120-132, 2nd edition, Washington DC, ACS Profesional Reference Book
- (1994) Introduction to Microlithography , pp. 120-132
- Bowden, M.J.¹

4
- 0022984975
- Mask making for synchrotron radiation lithograh
- Ehrfeld W; Glashauser W; Munchmeyer D; Sshejb W: (1986) Mask making for synchrotron radiation lithograh, Microelectronic Eng., 5, p. 463-470
- (1986) Microelectronic Eng. , vol.5 , pp. 463-470
- Ehrfeld, W.¹ Glashauser, W.² Munchmeyer, D.³ Sshejb, W.⁴

5
- 2542521842
- Dosage modeling for deep x-ray lithography application
- Microsystem Technologies, printing
- Shih W-P; Shew BY; Cheng Y; Hwant G-J: (1997) Dosage modeling for deep x-ray lithography application, Harmst 97, Microsystem Technologies, printing
- (1997) Harmst 97
- Shih, W.-P.¹ Shew, B.Y.² Cheng, Y.³ Hwant, G.-J.⁴

6
- 0344300487
- Springer-Verlag
- Cheng Y: (1996) LIGA activity in Taiway, Microsystem Technologies 2, p. 157-161, Springer-Verlag
- (1996) LIGA Activity in Taiway, Microsystem Technologies , vol.2 , pp. 157-161
- Cheng, Y.¹

7
- 0242444231
- Dose distribution of synchrotron x-ray penetrating materials of low atomic numbers
- Cheng Y; Kup N-Y; Su CH: (1997) Dose distribution of synchrotron x-ray penetrating materials of low atomic numbers. Review of Scientific Instruments, Vol. 68, No. 5, p. 2163-p.2166
- (1997) Review of Scientific Instruments , vol.68 , Issue.5 , pp. 2163-2166
- Cheng, Y.¹ Kup, N.-Y.² Su, C.H.³

8
- 2542511501
- A method of fabricating a thin, and low stress dielectric film for microsensors applications
- Leuven, Belgium
- Chou BCS; Chen C-N; Shie J-S: (1996) A method of fabricating a thin, and low stress dielectric film for microsensors applications. Eurosensors X, Leuven, Belgium, p1.1-173
- (1996) Eurosensors X
- Chou, B.C.S.¹ Chen, C.-N.² Shie, J.-S.³

9
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- X-ray lithography
- Beijing, China
- Petzold H-C: (1988) X-ray lithography. Proceedings of the CCAST Symposium, Beijing, China, p. 277-370
- (1988) Proceedings of the CCAST Symposium , pp. 277-370
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10
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- Analyse der defektursachen und der genauigkeit der strukturubertagung bei der Röntgentiefen-lithographie mit synchrotronstrahlung
- Kernforschungszentrum, Karlsruhe
- Mohr J; Ehrfeld W; Münchmeyer D: (1988) Analyse der defektursachen und der genauigkeit der strukturubertagung bei der Röntgentiefen-lithographie mit synchrotronstrahlung, KfK-Bericht 4414, p. 71, Kernforschungszentrum, Karlsruhe
- (1988) KfK-Bericht , vol.4414 , pp. 71
- Mohr, J.¹ Ehrfeld, W.² Münchmeyer, D.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.