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Journal of the American Ceramic Society

Volumn 93, Issue 7, 2010, Pages 1860-1862

Fabrication of p-type Li-doped ZnO films by RF magnetron sputtering

(3) Chiu, Kuo Chuang a,b Kao, Yi Wen b Jean, Jau Ho a

a NATIONAL TSING HUA UNIVERSITY (Taiwan)

b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AQUEOUS SOLUTIONS; DOPED ZNO; ELECTRICAL RESISTIVITY; GLASS SUBSTRATES; LI CONTENT; OPTICAL TRANSMITTANCE; P-TYPE; RF-MAGNETRON SPUTTERING; ROOM TEMPERATURE; SPUTTERING TARGET; TARTARIC ACIDS; THERMAL DECOMPOSITIONS; VISIBLE REGION;

CARRIER CONCENTRATION; DISSOLUTION; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; GALVANOMAGNETIC EFFECTS; GELS; HALL MOBILITY; MAGNETRON SPUTTERING; METALLIC FILMS; PYROLYSIS; SUBSTRATES; ZINC; ZINC OXIDE;

LITHIUM;

EID: 77953782063 PISSN: 00027820 EISSN: 15512916 Source Type: Journal
DOI: 10.1111/j.1551-2916.2010.03636.x Document Type: Article

Times cited : (18)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.